Plasma process for reducing friction within the lumen of polymer

Details Plasma process for reducing friction within the lumen of polymer Plasma process for reducing friction within the lumen of polymer

1997-06-24

1998-11-03

Gorgos, Kathryn L.

Chemistry: electrical and wave energy

Processes and products

Electrostatic field or electrical discharge

204164, H05H 124

Patent

active

058303294

ABSTRACT:
This invention relates to the preferential glow discharge at the inside diameter (ID) of plastic tubing, particularly very small tubing.

REFERENCES:
patent: 4261806 (1981-04-01), Asai et al.
patent: 4488954 (1984-12-01), Hatada
patent: 4508606 (1985-04-01), Andrade eta l.
patent: 4692347 (1987-09-01), Yasuda
patent: 4718907 (1988-01-01), Karwoski
patent: 4752426 (1988-06-01), Cho
patent: 4846101 (1989-07-01), Montgomery
patent: 4927676 (1990-05-01), Williams
patent: 4948628 (1990-08-01), Montgomery
patent: 5133422 (1992-07-01), Coury
patent: 5133986 (1992-07-01), Blum
patent: 5198033 (1993-03-01), Kelley
patent: 5223308 (1993-06-01), Doehler
patent: 5244654 (1993-09-01), Narayanan

Affiliated with

Also associated with

Rating

Plasma process for reducing friction within the lumen of polymer does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Plasma process for reducing friction within the lumen of polymer, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Plasma process for reducing friction within the lumen of polymer will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-685866