Chemistry: electrical and wave energy – Processes and products – Processes of treating materials by wave energy
Patent
1987-12-07
1989-12-26
Hearn, Brian E.
Chemistry: electrical and wave energy
Processes and products
Processes of treating materials by wave energy
148DIG45, 118723, 372 76, 378 34, 20415763, 20419225, 156345, H01S 309
Patent
active
048896055
ABSTRACT:
A plasma pinch system includes a fluid-jet pinch device for establishing a plasma source composed of a tenuous vapor preconditioning cloud surrounding a central narrow flowing fine stream of fluid under pressure. A discharge device is connected electrically to the fluid-jet pinch device for supplying an electrical flow through a portion of the fluid stream for establishing an incoherent light emitting plasma therealong. A method of using the plamsa pinch system for manufacturing semiconductors, includes exposing a semiconductor wafer to the incoherent light emitted by the plasma for either annealing or etching purposes.
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Asmus John F.
Lovberg Ralph H.
Bunch William
Hearn Brian E.
Kleinke Bernard L.
Potts Jerry R.
The Regents of the University of California
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