Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate
2004-07-30
2010-10-05
Hassanzadeh, Parviz (Department: 1716)
Coating apparatus
Gas or vapor deposition
With treating means
C156S345360, C156S345410
Reexamination Certificate
active
07806077
ABSTRACT:
Microwave plasma nozzle array systems and methods for configuring the microwave plasma nozzle arrays are disclosed. The microwaves are transmitted to a microwave cavity in a specific manner and form an interference pattern that includes high-energy regions within the microwave cavity. The high-energy regions are controlled by the phases and the wavelengths of the microwaves. A plurality of nozzle elements is provided in the array. Each of the nozzle elements has a portion partially disposed in the microwave cavity and receives a gas for passing therethrough. The nozzle elements receive microwave energy from one of the high-energy regions. Each of the nozzle elements include a rod-shaped conductor having a tip that focuses the microwaves and a plasma is then generated using the received gas.
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Kim Jay Joongsoo
Lee Sang Hun
Amarante Technologies, Inc.
Dhingra Rakesh
Hassanzadeh Parviz
Saian Corporation
Smith Patent Office
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