Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board
Patent
1988-06-30
1989-07-11
Powell, William A.
Coating processes
Electrical product produced
Integrated circuit, printed circuit, or circuit board
156653, 156657, 156662, 427124, 4272554, 427252, 437 41, 437200, B05D 306, B05D 512, H01L 2100, H01L 21306
Patent
active
048471119
ABSTRACT:
A process for forming a diffusion barrier on exposed silicon and polysilicon contacts of an integrated circuit including the step of chemically vapor depositing a layer of tungsten in a self-aligned manner on the exposed contact areas. The layer of tungsten is plasma nitridated to form a tungsten nitride layer and to partially form a tungsten silicide layer adjacent the contact areas. The formation of the tungsten silicide layer is completed by thermal annealing.
REFERENCES:
patent: 4676866 (1987-06-01), Tang et al.
Chin Maw-Rong
Chow Yu C.
Liao Kuan-Yang
Float Kenneth W.
Gudmestad Terje
Hughes Aircraft Company
Karambelas A. W.
Powell William A.
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