Plasma monitoring method and plasma monitor

Details Plasma monitoring method and plasma monitor Plasma monitoring method and plasma monitor

1983-01-05

1985-09-17

Evans, F. L.

Optics: measuring and testing

By dispersed light spectroscopy

With sample excitation

356417, 356418, G01J 348

Patent

active

045417180

ABSTRACT:
A plasma monitoring method and a plasma monitor in a dry process which utilizes a plasma. Among a large number of chemical species which constitute the plasma, one or two specified chemical species suited to grasp the situation of the dry process has/have its/their plasma light/lights detected so as to obtain the three-dimensional distribution of the densities of the single specified chemical species or the ratios of the two specified chemical species in the plasma.

REFERENCES:
patent: 2734418 (1956-02-01), Enns
patent: 3298275 (1967-01-01), DuBois et al.
patent: 3744918 (1973-07-01), Jacobsson
patent: 3794425 (1974-02-01), Smith et al.
patent: 4164373 (1979-08-01), Schuss et al.
Masaharu Oshima, Optical Spectroscopy in Reactive Sputter Etching and Its Application to Process Control, Japanese Journal of Applied Physics, vol. 20, No. 4, Apr. 1981, pp. 683-690.

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