Plasma method and apparatus for carrying out high temperature ch

Chemistry of inorganic compounds – Halogen or compound thereof – Binary compound containing metal

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204164, C01G 3300, C01G 3500, C01G 3900, B01K 100

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active

039549542

ABSTRACT:
In the process of carrying out high temperature, chemical reactions including reductions for producing elemental metal powders, especially refractory metals; chlorinations for producing halogens and for chemical synthesis in general using a plasma generator, the reactant or reactants feed material is introduced into the reaction zone of the apparatus and the effluent from the reaction zone is directed into a quenching zone through a selectively variable passageway or orifice in a manner that permits in the reduction process separation of the desired reaction product from the effluent hot gas stream and the continuous collection of the reaction product in a collection zone wherein in some instances, the reaction product is of a selected characteristic, controlled by the maintenance of certain operational parameters, including a selected differential fluid pressure in the reaction and collection zone as well as reaction and collection zone temperatures. Apparatus for carrying out the high temperature chemical reactions is disclosed.

REFERENCES:
patent: 1280471 (1918-10-01), Hoofnagle
patent: 2860094 (1958-11-01), Ishizuka
patent: 3280018 (1966-10-01), Denis
patent: 3293005 (1966-12-01), McCord
patent: 3309299 (1967-03-01), Mantell
patent: 3320023 (1967-05-01), George
patent: 3469941 (1969-09-01), Kuhn
patent: 3652434 (1972-03-01), Bar-Nun et al.
patent: 3679363 (1972-07-01), Skvivan
patent: 3708409 (1973-01-01), Bainbridge

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