Plasma mass spectrometry

Details Plasma mass spectrometry Plasma mass spectrometry

1994-03-07

1996-05-21

Anderson, Bruce C.

Radiant energy

Ionic separation or analysis

With sample supply means

250281, B01D 5944, H01J 4900

Patent

active

055192157

ABSTRACT:
A plasma mass spectrometer has a plasma ion source (1). The source has associated with it an electromagnetic excitation means (2), which may be one or more induction coils. The excitation means is powered by an RF generator (3). Ions are sampled from the plasma ion source through an interface (15) into a vacuum chamber (16). The stream of ions is directed by an ion optics element (4) through a mass analyser (5) to an ion detector (6). The excitation means may include means (7) for altering the axial component of the electromagnetic field sustaining the plasma. Alternatively or additionally, the spectrometer may include signal detecting means (11,17) to provide feedback enabling optimisation of parameters.

REFERENCES:
patent: Re33386 (1985-02-01), Douglas
patent: 3958883 (1976-05-01), Turner
patent: 4501965 (1985-02-01), Douglas
patent: 4629940 (1986-12-01), Gagne
patent: 4682026 (1987-07-01), Douglas
patent: 4849675 (1989-07-01), Muller
patent: 4955717 (1990-09-01), Henderson
patent: 4982140 (1991-01-01), Witting
patent: 4999492 (1991-03-01), Nakagawa
patent: 5185523 (1993-02-01), Kitagawa et al.
patent: 5194731 (1993-03-01), Turner
patent: 5383019 (1995-01-01), Farrell et al.
Article by Rudolph, R. N. and Moore, J. H., entitled "Plasma Polymerization and a-C:H Film Ablation in Microwave Discharges in Methane Diluted with Argon and Hydrogen", published in Plasma Chemistry and Plasma Processing, vol. 10, No. 3, 1990.

Affiliated with

Also associated with

Rating

Plasma mass spectrometry does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Plasma mass spectrometry, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Plasma mass spectrometry will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2039617