Plasma leak monitoring method, plasma processing apparatus...

Details Plasma leak monitoring method, plasma processing apparatus... Plasma leak monitoring method, plasma processing apparatus...

2007-05-15

2007-05-15

Lee, John R. (Department: 2878)

Radiant energy

Photocells; circuits and apparatus

Flame light source

C250S226000

Reexamination Certificate

active

10644745

ABSTRACT:
In a plasma processing apparatus that forms plasma from a process gas by supplying the process gas into a processing container and applying high-frequency power to an electrode provided inside the processing container on which a workpiece is placed and executes specific plasma processing on the processing surface of the workpiece, apparatus state parameter data indicating a state of the plasma processing apparatus are obtained through measurement executed by a parameter measuring instrument, optical data are obtained through measurement executed by an optical measuring instrument and electrical data are obtained through measurement executed by an electrical measuring instrument. A means for plasma leak judgment judges that a plasma leak has occurred if there is a fluctuation in the data.

REFERENCES:
patent: 6791692 (2004-09-01), Powell et al.
patent: 2003/0085662 (2003-05-01), Kwon et al.
patent: 2003/0205460 (2003-11-01), Buda
patent: 2004/0168771 (2004-09-01), Mitrovic
patent: 64-081197 (1989-03-01), None
patent: 2000-100795 (2000-04-01), None
patent: 2001-319922 (2001-11-01), None
patent: WO 00/03421 (2000-01-01), None
English Abstract of JP 64-081197.
English Abstract of JP 2000-100795.
English Abstract of JP 2001-319922.

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