Plasma lamp and method

Details Plasma lamp and method Plasma lamp and method

2005-05-24

2005-05-24

Patel, Ashok (Department: 2879)

Electric lamp and discharge devices

With gas or vapor

Having a particular total or partial pressure

C313S112000, C313S635000, C313S638000, C313S640000

Reexamination Certificate

active

06897609

ABSTRACT:
An apparatus and method for achieving desired spectral emission characteristics in plasma lamps is disclosed. The apparatus and method use multi-layer thin film optical interference coatings to selectively reflect a portion of the light such that it can be absorbed in the plasma. The multi-layer thin film coating is applied to any surface of the lamp, which substantially surrounds the plasma. The number and thickness of the layers in the coating are selected to ensure that a significant portion of the selected light emitted from the plasma is reflected by the coating and absorbed by the plasma. The properties of the coating, reflectance, transmittance and absorption are determined as a function of plasma and lamp characteristics. These characteristics include the spectral emission characteristics of the plasma, the spectral absorption characteristics of the plasma, the physical dimensions of the plasma, the angular distribution of the light emitted from the plasma on the coating and the geometry of the coated surface.

REFERENCES:
patent: 3234421 (1966-02-01), Reiling
patent: 4020377 (1977-04-01), Popp et al.
patent: 5363007 (1994-11-01), Fromm et al.
patent: 5471110 (1995-11-01), van der Leeuw et al.
patent: 5552671 (1996-09-01), Parham et al.
patent: 5610469 (1997-03-01), Bergman et al.
patent: 5646472 (1997-07-01), Horikoshi
patent: 5694002 (1997-12-01), Krasko et al.
patent: 5751111 (1998-05-01), Stoffels et al.
patent: 5849162 (1998-12-01), Bartolomei et al.
patent: 6005346 (1999-12-01), Shaffner
patent: 6072268 (2000-06-01), Dolan et al.
patent: 6229252 (2001-05-01), Teng et al.
patent: 6605888 (2003-08-01), Waymouth et al.

Affiliated with

Also associated with

Rating

Plasma lamp and method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Plasma lamp and method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Plasma lamp and method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3385004