Coating apparatus – Gas or vapor deposition – With treating means
Patent
1993-07-28
1995-01-17
King, Roy V.
Coating apparatus
Gas or vapor deposition
With treating means
118729, 118730, 427577, 4272555, 423446, C23C 1654, C23C 1650
Patent
active
053822935
ABSTRACT:
An apparatus for depositing a diamond film on a substrate includes a first electrode formed as an enclosed body having a nozzle for jetting thermal plasma opening therefrom and a second electrode of opposite polarity positioned in the nozzle. The apparatus additionally includes a power source for applying a direct current voltage between the electrodes. A gas is fed between the electrodes as a direct current voltage is applied thereto, whereby the gas is formed into a thermal plasma which is jetted through the nozzle. A starting gas feed system is included for feeding gaseous starting compounds for vapor phase deposition to the plasma jet and a powder supplying pipe is provided for feeding a metal powder between the electrodes.
REFERENCES:
patent: 4851254 (1989-07-01), Yamamoto et al.
patent: 4882138 (1989-11-01), Pinneo
patent: 4914977 (1990-04-01), Okamoto et al.
patent: 4919974 (1990-04-01), McCune et al.
patent: 4987002 (1991-01-01), Sakamoto et al.
patent: 4988421 (1991-01-01), Drawl et al.
patent: 4989542 (1991-02-01), Kamo
patent: 5204145 (1993-04-01), Gasworth
Patent Abstracts of Japan, vol. 14, No. 171 (C-706) [4114], 3rd Apr. 1990; & JP-A-2 22 471 (Fujitsu Ltd) 25-01-1991 * whole document *.
Patent Abstracts of Japan, vol. 13, No. 69 (C-697) [4061], 6th Mar. 1990; & JP-A-1 317 197 (Kanegafuchi Chem. Ind. Co., Ltd) 21-12-1989 * whole document *.
Patent Abstracts of Japan, vol. 14, No. 397, 28th Aug. 1990; & JP-A-02 149 412 (Namiki Precision Jewel Co., Ltd) 08-06-1990 * whole document *.
Kawarada Motonobu
Koshino Nagaaki
Kurihara Kazuaki
Sasaki Ken-ichi
Teshima Akitomo
Fujitsu Limited
King Roy V.
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