Plasma ion source mass analyzing apparatus

Details Plasma ion source mass analyzing apparatus Plasma ion source mass analyzing apparatus

1994-09-08

1996-09-24

Anderson, Bruce C.

Radiant energy

Ion generation

Field ionization type

250288, H01J 2700, H01J 4900, B01D 5944

Patent

active

055593372

ABSTRACT:
In order to provide an ion beam lens to which a film causing a charge and rendering the analysis unstable will not adhere, the ion lens is provided with a deflector for deflecting an ion beam 90.degree.. The side of the deflector opposite the sampling interface is provided with an opening. Also, a correction electrode having at least a pair of elements is interposed between the deflector and a mass filter. Not only may a minute amount of impurities in a sample be detected, but also measurements may be conducted on a consistently stable basis.

REFERENCES:
patent: 3626178 (1971-12-01), Cohen
patent: 3786249 (1974-01-01), Anbar et al.
patent: 4963735 (1990-10-01), Okamoto et al.
patent: 4999492 (1991-03-01), Nakagawa
patent: 5049739 (1991-09-01), Okamoto
patent: 5153433 (1992-10-01), Andresen et al.
patent: 5357107 (1994-10-01), Ibach et al.

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