Plasma ion mass analyzing apparatus

Electricity: measuring and testing – Using ionization effects – For analysis of gas – vapor – or particles of matter

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324459, 324464, 250281, 250294, G01N 2762, H01J 4920, B01D 5944

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06031379&

ABSTRACT:
A mechanism is provided for reducing contamination of the interior of an apparatus by a sample and for performing a stable measurement. An ion lens has an Einzel lens for converging an ion beam, a deflector for deflecting the ion beam and a pair of compensation electrodes each composed of one or more elements. A mechanism is provided for controlling a voltage to be applied to each of the electrodes as desired. Also, alternatively, a shield plate is provided in a flow path of the ion beam. A drive mechanism is provided for projecting and retracting the shield plate. With such an arrangement, it is possible not only to effectively detect a small amount of impurities contained in a sample but also to stably measure the concentration thereof.

REFERENCES:
patent: 4999492 (1991-03-01), Nakagawa
patent: 5202562 (1993-04-01), Koga et al.
patent: 5481107 (1996-01-01), Takada et al.
patent: 5559337 (1996-09-01), Ito et al.
patent: 5616918 (1997-04-01), Oishi et al.
patent: 5804821 (1998-09-01), Nakagawa
"Basic and Application of ICP Light Emission Analysis" by Haraguchi, published by Kohdansha Scientific, Oct. 1986, pp. 98-108.
"An Introduction To Inductively Coupled Plasma Source Mass Spectometry" by Alan R. Date, Trends in Analytical Chemistry, vol. 2, No. 10, 225-230, 1983 (month unavailable).

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