Coating apparatus – Gas or vapor deposition – With treating means
Patent
1998-03-02
2000-05-02
Dang, Thi
Coating apparatus
Gas or vapor deposition
With treating means
118723AN, 156345, 156 89, 427 38, C23C 1600
Patent
active
060559284
ABSTRACT:
An apparatus and method for fabricating a spherical shaped semiconductor integrated circuit according to which a chamber is provided into which spheres of a semiconductor material are introduced therein. Process gases are also selectively introduced into the chamber. The chamber includes a metallic portion that is selectively provided a voltage. Upon receiving the voltage, the chamber attracts ions from the process gases, at least some of the attracted ions treating the spheres according to a particular aspect of the fabrication process.
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Murzin Ivan Herman
Zhang Yanwei
Ball Semiconductor Inc.
Dang Thi
Zervigon Rudy
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