Plasma ignition method and apparatus

Details Plasma ignition method and apparatus Plasma ignition method and apparatus

2005-05-10

2005-05-10

Paschall, Mark (Department: 3742)

Electric heating

Metal heating

By arc

C219S121410, C216S067000, C204S298380, C156S345360

Reexamination Certificate

active

06891123

ABSTRACT:
Method and an apparatus for igniting plasma in a semiconductor manufacturing apparatus are disclosed. An example plasma ignition method and apparatus sets a predetermined pressure, source power and bias power of a chamber and flows a predetermined flow rate of CHF3and Ar gases into the chamber, introduces a predetermined flow rate of Cl2gas into the chamber, completes the supply of Cl2gas, and ignites plasma.

REFERENCES:
patent: 5637153 (1997-06-01), Niino et al.
patent: 6291361 (2001-09-01), Hsia et al.
patent: 6547978 (2003-04-01), Ye et al.
patent: 6579805 (2003-06-01), Bar-Gadda
patent: 20010055852 (2001-12-01), Moise et al.

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