Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Electron or ion source
Patent
1988-06-24
1990-12-11
LaRoche, Eugene R.
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Electron or ion source
31511141, 31511121, 250433R, 250427, 250431, 31323131, H05H 124
Patent
active
049773526
ABSTRACT:
A plasma generator 10 which includes an rf driven cathode 40 capable of using reactive gases and having a cathode housing 54. A gas feed system 20 introduces gas into an antechamber 42 defined by the cathode housing 54. An electric field is generated within the antechamber 42 by an antenna 46. A grid 50 mounted within the antechamber 42 defines first R1 and second R2 regions therein, a first region R1 between the antenna 46 and the grid 50, and a second region R2. The grid 50 confines the electric field generated by the antenna 46 to the first region R1 of the antechamber 42 to induce a discharge of electrons from the gas therein. The grid 50 further allows at least a portion of the discharged electrons to migrate to the second region R2 to ionize the gas therein into a cathode plasma 60. In one embodiment, the plasma 60 is then induced to flow into a discharge chamber 70 defined by an anode shell 72. A plurality of magnets 74, 76 and 78 adjust the motion of electrons within the discharge chamber 70 thereby further increasing the efficiency with which the cathode plasma 60 is converted into a more highly ionized discharge plasma 82.
REFERENCES:
patent: 3515932 (1970-06-01), King
patent: 3610985 (1971-10-01), Fleming et al.
patent: 4481062 (1984-11-01), Kaufman et al.
patent: 4642522 (1987-02-01), Harvey et al.
patent: 4777370 (1988-10-01), Pigache et al.
patent: 4778561 (1988-10-01), Ghanbari
patent: 4810935 (1989-03-01), Boswell
patent: 4841197 (1989-06-01), Takayama et al.
patent: 4859908 (1989-08-01), Yoshida et al.
1986 American Institute of Physics, "High-Power Radio-Frequency Plasma Source", C. Craig Petty et al, pp. 2409-2414.
K. Tokiguchi et al, "Beam Extraction Experiments from Microwave Ion Sources", Review of Sci. Instrum., vol. 57 (8), Aug. 1986, pp. 1526-1530.
D. P. Grubb et al, "Conical Slow Wave Antenna as a Plasma Source", Review of Sci. Instrum., vol. 49 (1), Jan. 1978, pp. 77-79.
M. Matsuoka et al, "Low Energy Ion Extraction with Small Dispersion from an Electron Cyclotron Resonance Microwave Plasma Stream", Applied Physics Letters, vol. 50 (26), Jun. 29, 1987, pp. 1864-1865.
S. Nakanishi, "Parallel Plate R.F. Ion Thruster", AIAA/JSASS/DGLR 16th International Electric Propulsion Conference, Nov. 17, 19, 1982.
C. Lejeune et al, "RF Multipolar Plasma for Broad and Reactive Ion Beams", Vacuum, vol. 36, Nos. 11/12, 1986, pp. 837-840.
Coble P. M.
Denson-Low W. K.
Duraiswamy V. D.
Hughes Aircraft Company
LaRoche Eugene R.
LandOfFree
Plasma generator having rf driven cathode does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Plasma generator having rf driven cathode, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Plasma generator having rf driven cathode will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-391824