Plasma generator having rf driven cathode

Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Electron or ion source

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31511141, 31511121, 250433R, 250427, 250431, 31323131, H05H 124

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active

049773526

ABSTRACT:
A plasma generator 10 which includes an rf driven cathode 40 capable of using reactive gases and having a cathode housing 54. A gas feed system 20 introduces gas into an antechamber 42 defined by the cathode housing 54. An electric field is generated within the antechamber 42 by an antenna 46. A grid 50 mounted within the antechamber 42 defines first R1 and second R2 regions therein, a first region R1 between the antenna 46 and the grid 50, and a second region R2. The grid 50 confines the electric field generated by the antenna 46 to the first region R1 of the antechamber 42 to induce a discharge of electrons from the gas therein. The grid 50 further allows at least a portion of the discharged electrons to migrate to the second region R2 to ionize the gas therein into a cathode plasma 60. In one embodiment, the plasma 60 is then induced to flow into a discharge chamber 70 defined by an anode shell 72. A plurality of magnets 74, 76 and 78 adjust the motion of electrons within the discharge chamber 70 thereby further increasing the efficiency with which the cathode plasma 60 is converted into a more highly ionized discharge plasma 82.

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