Plasma generating nozzle having impedance control mechanism

Coating apparatus – Gas or vapor deposition – With treating means

Reexamination Certificate

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Details

C118S7230DC, C219S121500, C219S121360

Reexamination Certificate

active

07921804

ABSTRACT:
The present invention provides a plasma generating system that includes: a microwave generator for generating microwave energy; a power supply connected to the microwave generator for providing power thereto; a microwave cavity; a waveguide operatively connected to the microwave cavity for transmitting microwave energy thereto; an isolator for dissipating microwave energy reflected from the microwave cavity; and at least one nozzle coupled to the microwave cavity. The nozzle includes: a housing having a generally cylindrical space formed therein, the space forming a gas flow passageway; a rod-shaped conductor disposed in the space and operative to transmit microwave energy along a surface thereof so that the microwave energy excites gas flowing through the space; and an impedance controlling structure which adjusts the impedance of the nozzle.

REFERENCES:
patent: 3353060 (1967-11-01), Yamamoto et al.
patent: 3911318 (1975-10-01), Spero et al.
patent: 4151034 (1979-04-01), Yamamoto et al.
patent: 4185213 (1980-01-01), Scannell
patent: 4609808 (1986-09-01), Bloyet et al.
patent: 4611108 (1986-09-01), Leprince et al.
patent: 4652723 (1987-03-01), Salinier et al.
patent: 4711627 (1987-12-01), Oeschsle et al.
patent: 5083004 (1992-01-01), Wells et al.
patent: 5114770 (1992-05-01), Echizen et al.
patent: 5349154 (1994-09-01), Harker et al.
patent: 5565118 (1996-10-01), Asquith
patent: 5645796 (1997-07-01), Caputo et al.
patent: 5679167 (1997-10-01), Muehlberger
patent: 5689949 (1997-11-01), DeFreitas et al.
patent: 5793013 (1998-08-01), Read et al.
patent: 5972302 (1999-10-01), Tranquilla et al.
patent: 5994663 (1999-11-01), Lu
patent: 6039834 (2000-03-01), Tanaka et al.
patent: 6125859 (2000-10-01), Kao et al.
patent: 6157867 (2000-12-01), Hwang et al.
patent: 6230060 (2001-05-01), Mawhinney
patent: 6262386 (2001-07-01), Foernsel
patent: 6388225 (2002-05-01), Blum et al.
patent: 6417013 (2002-07-01), Teixeira et al.
patent: 6439155 (2002-08-01), Kamarehi et al.
patent: 6525481 (2003-02-01), Kilma et al.
patent: 6673200 (2004-01-01), Gu et al.
patent: 6734385 (2004-05-01), Bark et al.
patent: 7164095 (2007-01-01), Lee et al.
patent: 7338575 (2008-03-01), Pingree, Jr. et al.
patent: 7554054 (2009-06-01), Takada et al.
patent: 2001/0024114 (2001-09-01), Kitagawa et al.
patent: 2002/0020691 (2002-02-01), Jewett et al.
patent: 2002/0050323 (2002-05-01), Moisan et al.
patent: 2003/0000823 (2003-01-01), Uhm et al.
patent: 2003/0032207 (2003-02-01), Rengarajan et al.
patent: 2003/0085000 (2003-05-01), Horioka et al.
patent: 2003/0178140 (2003-09-01), Hanazaki et al.
patent: 2003/0199108 (2003-10-01), Tanaka et al.
patent: 2004/0007326 (2004-01-01), Roche et al.
patent: 2004/0016402 (2004-01-01), Walther et al.
patent: 2004/0079287 (2004-04-01), Smith et al.
patent: 2004/0083797 (2004-05-01), Ward et al.
patent: 2004/0173583 (2004-09-01), Iriyama et al.
patent: 2004/0262268 (2004-12-01), Wu
patent: 2006/0006153 (2006-01-01), Lee et al.
patent: 2006/0021581 (2006-02-01), Lee et al.
patent: 2006/0021980 (2006-02-01), Lee et al.
patent: 2006/0042546 (2006-03-01), Ishii et al.
patent: 2006/0057016 (2006-03-01), Kumar et al.
patent: 2007/0221634 (2007-09-01), Condick
patent: 2008/0017616 (2008-01-01), Lee et al.
patent: 2008/0029030 (2008-02-01), Goto et al.
patent: 2008/0073202 (2008-03-01), Lee et al.
patent: 2008/0093358 (2008-04-01), Lee et al.
patent: 2010/0201272 (2010-08-01), Lee
patent: 2704179 (2005-06-01), None
patent: 101137267 (2008-03-01), None
patent: 0 397 468 (1990-11-01), None
patent: 60-046029 (1985-03-01), None
patent: 60-502243 (1985-12-01), None
patent: 62-81274 (1987-04-01), None
patent: 62-228482 (1987-10-01), None
patent: 3-075318 (1991-03-01), None
patent: 5-146879 (1993-06-01), None
patent: 6-013329 (1994-01-01), None
patent: 6-244140 (1994-09-01), None
patent: 7-135196 (1995-05-01), None
patent: 7-258828 (1995-10-01), None
patent: 9-169595 (1997-06-01), None
patent: 10-284296 (1998-10-01), None
patent: 2001-044177 (2001-02-01), None
patent: 2001-502110 (2001-02-01), None
patent: 2001-068298 (2001-03-01), None
patent: 2002-124398 (2002-04-01), None
patent: 2003-033862 (2003-02-01), None
patent: 2003-059917 (2003-02-01), None
patent: 2003-086580 (2003-03-01), None
patent: 2003-133302 (2003-05-01), None
patent: 2003-167017 (2003-06-01), None
patent: 2003-171785 (2003-06-01), None
patent: 2003-197397 (2003-07-01), None
patent: 2003-213414 (2003-07-01), None
patent: 2004-006211 (2004-01-01), None
patent: 2004-237321 (2004-08-01), None
patent: 2004-285187 (2004-10-01), None
patent: 2005-002355 (2005-01-01), None
patent: 2005-095744 (2005-04-01), None
patent: 2005-116217 (2005-04-01), None
patent: 2005-235464 (2005-09-01), None
patent: 2005-534187 (2005-11-01), None
patent: 2006-121073 (2006-05-01), None
patent: 2007-530955 (2007-11-01), None
patent: 2008-508683 (2008-03-01), None
patent: 2006-0001944 (2006-01-01), None
patent: WO-2004-017046 (2004-01-01), None
patent: WO-2005/096681 (2005-10-01), None
patent: WO-2006/014862 (2006-02-01), None

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