Coating processes – Direct application of electrical – magnetic – wave – or... – Polymerization of coating utilizing direct application of...
Patent
1997-09-24
1999-05-04
Pianalto, Bernard
Coating processes
Direct application of electrical, magnetic, wave, or...
Polymerization of coating utilizing direct application of...
118723E, 118723R, 427 58, 427127, 4272553, 4272556, 427471, 427474, 427547, 427578, 427598, C08J 718
Patent
active
059002840
ABSTRACT:
Methods and devices for producing plasmas of more uniform density and greater height than plasmas generated by previously known magnetron-type plasma-generating devices. The present invention utilizes electrodes containing multiple magnets positioned such that like magnetic poles of the magnets are all facing in substantially the same direction.
REFERENCES:
patent: 2146025 (1939-02-01), Penning
patent: 4013532 (1977-03-01), Cormia et al.
patent: 4260647 (1981-04-01), Wang et al.
patent: 4282083 (1981-08-01), Kertesz et al.
patent: 4336278 (1982-06-01), Pertzsch et al.
patent: 4496450 (1985-01-01), Hitotsuyanagi et al.
patent: 4818358 (1989-04-01), Hubert et al.
patent: 4863756 (1989-09-01), Hartig et al.
patent: 4886565 (1989-12-01), Koshiba et al.
patent: 5160398 (1992-11-01), Yanagida
patent: 5178743 (1993-01-01), Kumar
patent: 5298587 (1994-03-01), Hu et al.
patent: 5320875 (1994-06-01), Hu et al.
patent: 5364666 (1994-11-01), Williams et al.
patent: 5433786 (1995-07-01), Hu et al.
patent: 5494712 (1996-02-01), Hu et al.
patent: 5605576 (1997-02-01), Sasaki et al.
Plasma Deposition, Treatment and Etching Of Polymers, "Plasma Polymer-Metal Composite Films", H. Biederman and L. Martinu, pp. 269-320 (no date available).
Handbook Of Plasma Processing Technology, "Magnetron Plasma Deposition Processes", S. M. Rossnagel, pp. 160-182 (no date available).
Solid State Technology/Apr. 1987, "Magnetically enhanced Plasma Deposition and Etching", Michael F. Lehay & Grzegoriz Kanganowics, pp. 99-105 (no month available).
The First Annual International Conference Of Plasma Chemistry And Technology, "Plasma Polymerization: Thin Effect of Frequency and of the Planar Magneron Geometry", N. Morosoff, pp. 41-53 (no date available).
Thin Solid Films 1993, "Plasma Polymerization of Tetramethydisiloxane by a Magnetron Glow Discharge", pp. 171-184 (no month available).
J. Vac, Sci. Tehnol (1978), "Plasma Polymerization of Ethylene by Magnetron Discharge", pp. 1815-1822 (no month available).
Hill Stanley K.
Pianalto Bernard
The Dow Chemical Company
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