Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1993-11-16
1995-03-21
Weisstuch, Aaron
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20429837, 156345, 118723R, 118723MR, 118723MA, 118723E, C23C 1435
Patent
active
053992539
ABSTRACT:
A plasma generating device to treat substrates in a vacuum chamber, includes a cathode which, at its upper surface, contains the material to be treated in the form of a target. At least one magnetic device is provided at the back side of the target, to generate, in the area of the cathode surface, at least one tunnel-like magnet field which forms tunnel foot poles on the cathode surface, whereby the tunnel-like field extends at least along a part of a horizontal tunnel axis. The magnetic device includes a mechanism for displacing at least one of the tunnel foot poles perpendicular to the horizontal tunnel axis. The magnetic device also includes a fixed first magnetic pole generating device and surrounding, as a closed frame, at least a second magnetic pole generating device which contains the mechanism for displacing the corresponding tunnel foot pole. The second magnetic pole generating device consists of a pair of permanent magnets which are placed on their longitudinal axes parallely pivotable to the target such that, in the area of the cathode surface, a tunnel-like laterally modifiable magnet field is generated.
REFERENCES:
patent: 3956093 (1976-05-01), McLeod
patent: 4466877 (1984-08-01), McKelvey
patent: 4600492 (1986-07-01), Ooshio et al.
Balzers Aktiengesellschaft
Weisstuch Aaron
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