Plasma generating apparatus with multiple microwave introducing

Details Plasma generating apparatus with multiple microwave introducing Plasma generating apparatus with multiple microwave introducing

1998-07-27

2000-08-29

Nguyen, Nam

Coating apparatus

Gas or vapor deposition

With treating means

118723MW, 156345, 20429838, 20429808, C23C 16511, C23C 1400, C23C 1600, C23F 102

Patent

active

061092088

ABSTRACT:
A plasma generating apparatus capable of improving the uniformity of a plasma processing and coping with a larger diameter of a substrate is obtained. Microwaves are distributed and emitted from a waveguide through the branching portions of a T branch to four rod antennas. The microwaves are introduced through four dielectric tubes into a vacuum vessel. In the vacuum vessel, a multi-cusp magnetic field and an electron cyclotron resonance region are caused by permanent magnets located around the vessel and, by an interaction between a vibrational electric field of the microwaves and a magnetic field, highly uniform plasma is generated in a region where a substrate or the like is subjected to a plasma processing.

REFERENCES:
patent: 4265730 (1981-05-01), Hirose et al.
patent: 5053678 (1991-10-01), Koike et al.
patent: 5134965 (1992-08-01), Tokuda et al.
patent: 5202095 (1993-04-01), Houchin et al.
patent: 5387288 (1995-02-01), Shatas
patent: 5429070 (1995-07-01), Campbell et al.
patent: 5874706 (1999-02-01), Ishii et al.

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