Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means
Patent
1991-06-12
1992-09-15
Simmons, David A.
Adhesive bonding and miscellaneous chemical manufacture
Differential fluid etching apparatus
With microwave gas energizing means
118723, 31511151, 20429806, 20429834, H01L 2100
Patent
active
051474930
ABSTRACT:
A plasma generating apparatus comprising a transformer including a primary winding connected to a high frequency power source and a secondary winding having two end terminals and a plurality of tap terminals connected between the end terminals, the transformer being adapted to deliver first and second high frequency electric powers with a phase difference of 180.degree. from the end terminals, upper and lower electrodes disposed in a vacuum chamber so as to be opposed at a distance from each other and supplied with the first and second high frequency powers, respectively, and a power ratio selector for switching the tap terminals to select the ratio between the first and second high frequency powers supplied to the electrodes, wherein a to-be-processed object placed on the lower electrode is processed by means of plasma formed between the electrodes.
REFERENCES:
patent: 2457663 (1948-12-01), Hanchett et al.
patent: 2637018 (1953-08-01), Hertog
patent: 4144477 (1979-03-01), Eaton
patent: 4222838 (1980-09-01), Bhagat et al.
patent: 4617079 (1986-10-01), Tracy et al.
patent: 4626312 (1986-12-01), Tracy
patent: 4846920 (1989-07-01), Keller et al.
patent: 4871421 (1989-10-01), Ogle et al.
patent: 4931135 (1990-06-01), Horiuchi et al.
Naitou Yukio
Nishimura Eiichi
Sugiyama Kazuhiko
Toda Akihito
Goudreau George
Simmons David A.
Tokyo Electron Limited
Tokyo Electron Yamanashi Limited
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