Plasma formation of hydride compounds

Details Plasma formation of hydride compounds Plasma formation of hydride compounds

1989-03-15

1990-08-07

Bueker, Richard

Coating apparatus

Gas or vapor deposition

Multizone chamber

118723, 427 39, C23C 1650

Patent

active

049458574

ABSTRACT:
The synthesis of hydride compounds by reacting both the ingredients of the compound and the hydrogen together in the presence of energy sufficient to ionize the hydrogen. An inert bombardment ingredient enhances efficiency. In situ generation of ingredients such as arsine is provided within the reactor adjacent the deposition site in chemical vapor deposition.

REFERENCES:
patent: 4505949 (1985-03-01), Jelks

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