Plasma focus high energy photon source

Details Plasma focus high energy photon source Plasma focus high energy photon source

1998-06-08

2000-04-18

Berman, Jack

Radiant energy

Radiant energy generation and sources

With radiation modifying member

2504931, 378119, H01J 3520

Patent

active

060518413

ABSTRACT:
A high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. A working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at voltages high enough to create electrical discharge between the electrodes to produce very high temperature, high density plasma pinch in the working gas providing radiation at the spectral line of the active gas. An external reflection radiation collector-director collects radiation produced in the plasma pinches and directs the radiation in a desired direction. In a preferred embodiment the active gas is lithium and the buffer gas is helium and the radiation-collector is coated with the material used for the electrodes. A good choice for the material is tungsten. In a second preferred embodiment the buffer gas is argon and lithium gas is produced by vaporization of solid lithium located in a hole along the axis of the central electrode of a coaxial electrode configuration.

REFERENCES:
patent: 3150483 (1964-09-01), Mayfield et al.
patent: 3232046 (1966-02-01), Meyer
patent: 3279176 (1966-10-01), Boden
patent: 3961197 (1976-06-01), Dawson
patent: 3969628 (1976-07-01), Roberts et al.
patent: 4042848 (1977-08-01), Lee
patent: 4143275 (1979-03-01), Mallozzi et al.
patent: 4203393 (1980-05-01), Giardini
patent: 4364342 (1982-12-01), Asik
patent: 4369758 (1983-01-01), Endo
patent: 4504964 (1985-03-01), Cartz et al.
patent: 4507588 (1985-03-01), Asmussen et al.
patent: 4536884 (1985-08-01), Weiss et al.
patent: 4538291 (1985-08-01), Iwamatsu
patent: 4561406 (1985-12-01), Ward
patent: 4618971 (1986-10-01), Weiss et al.
patent: 4633492 (1986-12-01), Weiss et al.
patent: 4635282 (1987-01-01), Okada et al.
patent: 4751723 (1988-06-01), Gupta et al.
patent: 4752946 (1988-06-01), Gupta et al.
patent: 4774914 (1988-10-01), Ward
patent: 4837794 (1989-06-01), Riordan et al.
patent: 5023897 (1991-06-01), Neff et al.
patent: 5102776 (1992-04-01), Hammer et al.
patent: 5142166 (1992-08-01), Birx
patent: 5175755 (1992-12-01), Kumakhov
patent: 5241244 (1993-08-01), Cirri
patent: 5442910 (1995-08-01), Anderson
patent: 5499282 (1996-03-01), Silfvast
patent: 5504795 (1996-04-01), McGeoch
patent: 5763930 (1998-06-01), Partlo
patent: 5866871 (1999-02-01), Birx
Bailey et al. "Evaluation of the gas puff z pinch as an x-ray lithography and microscopy source," Appl. Phys. Lett., 40(1), Jan. 1, 1982, pp. 33-35.
Choi et al., "Temporal development of hard and soft x-ray emission from a gas-puff Z pinch," Rev. Sci. Instrum., 57(8), Aug. 1986, pp. 2162-2164.
Giordano and Letardi, "Magnetic pulse compressor for prepulse discharge in spiker-sustainer excitation technique for XeCl lasers," Rev. Sci. Instrum., 65(8), Aug. 1994, pp. 247-2481.
Jahn, Physics of Electric Propulsion (New York: McGraw-Hill 1968) pp. 257-325.
Lowe, "Gas plasmas yield X rays for lithography," Electronics, Jan. 27, 1982, pp. 40-41.
Mather, "Formation of a High-Density Deuterium Plasma Focus," The Physics of Fluids, 8(2), Feb. 1965, pp. 366-377.
Matthews and Cooper, "Plasma sources for x-ray lithography" SPIE 333 Submicron Lithography, 1982, pp. 136-139.
Pearlman and Riordan, "X-ray lithography using a pulsed plasma source," J. Vac. Sci. Technol., 19(4), Nov./Dec. 1981, pp. 1190-1193.
Shiloh et al., "Z Pinch of a Gas Jet," The American Physical Society, 40(8), 1978, pp. 515-518.
Stallings et al., "Imploding argon plasma experiments," Appl. Phys. Lett., 35(7), Oct. 1, 1979, pp. 524-526.

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