Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate
2003-10-07
2010-10-26
Zervigon, Rudy (Department: 1716)
Coating apparatus
Gas or vapor deposition
With treating means
C156S345430, C156S345440
Reexamination Certificate
active
07819081
ABSTRACT:
In a plasma film forming apparatus, two first electrodes51connected to a power source4and two grounded second electrodes52are arranged in the order of the second electrode52, the first electrode51, the first electrode51and the second electrode52. A first flow passage50aformed between the central first electrodes51allows a raw material gas (first gas) for being formed into a film to pass therethrough. A plasma discharge space50bof a second flow passage formed between the first and second electrodes51, 52on the both sides allows an excitable gas (second gas) to pass therethrough, which excitable gas is exited by plasma such that the raw material can be formed into a film, but that the excitable gas itself is merely excited but not formed into a film. Those gases are converged at a crossing part20cbetween the first and second flow passages and blown off via a common blowoff passage25a. By this, the apparatus composing members such as electrodes can be prevented from being adhered with a film.
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Anzai Junichiro
Eguchi Yuji
Kawasaki Shinichi
Kitahata Hiroya
Nakajima Setsuo
Osha & Liang LLP
Sekisui Chemical Co. Ltd.
Zervigon Rudy
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