Coating apparatus – Gas or vapor deposition – Multizone chamber
Patent
1996-08-02
2000-01-25
Lund, Jeffrie R
Coating apparatus
Gas or vapor deposition
Multizone chamber
118723E, 118723ER, 118723R, C23C 1600
Patent
active
060173963
ABSTRACT:
A film formation device for forming a film on a substrate according to the present invention includes: a plurality of vacuum chambers, each of the plurality of vacuum chambers including a gas introduction section for introducing a reactive gas, a plasma generation section for generating a plasma, and a support member for supporting the substrate. The plasma generation section in at least one of the plurality of vacuum chambers is disposed at a predetermined position for preventing the substrate from sustaining substantial irradiation damage by the generated plasma.
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Lund Jeffrie R
Neuner George W.
Sharp Kabushiki Kaisha
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