Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means
Patent
1985-04-12
1986-10-14
Powell, William A.
Adhesive bonding and miscellaneous chemical manufacture
Differential fluid etching apparatus
With microwave gas energizing means
156643, 156646, 20419232, 204298, H01L 21306, B44C 122, C03C 1500, C23F 102
Patent
active
046170790
ABSTRACT:
A relatively small amount of high frequency RF power is mixed with a predominantly low frequency RF power to provide an improved etch rate uniformity of a semiconductor wafer in a low frequency plasma etching system.
REFERENCES:
patent: 4464223 (1984-08-01), Gorin
patent: 4500563 (1985-02-01), Ellenberger et al.
patent: 4579618 (1986-04-01), Celestino et al.
Balistee Brian G.
Tracy David H.
Grimes Edwin T.
Masselle Francis L.
Murphy Thomas P.
Powell William A.
The Perkin Elmer Corporation
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