Plasma-etching image in exposed AgX emulsion

Radiation imagery chemistry: process – composition – or product th – Post imaging processing – Including post developing step

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Details

156643, 156654, 156655, 156659, 204192E, 204192EC, 430370, 430942, 430461, 430430, 430271, 430275, 430278, 430306, G03C 500

Patent

active

042071054

ABSTRACT:
A method for forming an image comprising forming a silver, silver halide or binder image in the emulsion layer of a photographic material, which photographic material comprises a support having a silver halide emulsion layer thereon, by exposing and developing the photographic material, and plasma etching the emulsion layer to preferentially remove the emulsion layer at the non-image areas. Alternatively, the emulsion layer may be on a masking layer, whereafter, following exposing and developing, the photographic material is plasma etched to preferentially remove the emulsion layer at the non-image areas and to uncover the masking layer lying thereunder and then the masking layer is etched away at the uncovered areas.

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