Plasma etching electrode

Details Plasma etching electrode Plasma etching electrode

1980-08-11

1982-08-03

Reynolds, B. A.

Electric heating

Metal heating

By arc

219121PG, 219121PF, 156646, 42218605, B23K 900

Patent

active

043429017

ABSTRACT:
A planar plasma etcher (10) wherein a plurality of projections (36, 136, 236) extend from one electrode (18), with each projection aligned with a wafer (22) placed on the second electrode (20) to provide uniform etching across the surface of each wafer. The surface of the projection facing the wafer can take several forms depending on etching conditions, including convex, concave or frusto-conical.

REFERENCES:
patent: 4148705 (1979-04-01), Battey et al.
patent: 4158589 (1979-06-01), Keller et al.
patent: 4209357 (1980-06-01), Gorin et al.
patent: 4230515 (1980-10-01), Zajac

Affiliated with

Also associated with

Rating

Plasma etching electrode does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Plasma etching electrode, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Plasma etching electrode will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1469265