Plasma etching device and process

Details Plasma etching device and process Plasma etching device and process

1989-09-29

1992-03-24

Paschall, Mark H.

Electric heating

Metal heating

By arc

21912143, 21912144, 156345, 156646, 20429831, B23K 900

Patent

active

050991000

ABSTRACT:
Plasma etching device and process in which a chamber is divided into two regions by a perforated screen. Objects to be etched are placed in one region, and a plasma is formed in the other region. Etching occurs in the first region, and structure is included for heating the etched objects in the first region to facilitate the removal of photoresist used to define the areas to be etched.

REFERENCES:
patent: 3485591 (1969-12-01), Evans et al.
patent: 4028155 (1977-06-01), Jacob

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