Plasma enhanced thermal treatment apparatus

Details Plasma enhanced thermal treatment apparatus Plasma enhanced thermal treatment apparatus

1985-04-01

1989-09-26

Paschall, M. H.

Electric heating

Metal heating

By arc

21912140, 21912143, 156646, 156345, 2041921, B23K 900

Patent

active

048702455

ABSTRACT:
Apparatus for the nitridiation of a silicon-bearing substrate is disclosed. The apparatus includes a double walled reaction vessel having first and second concentric walls bounding a reaction volume. Temperature of the reaction volume is controlled by resistance heaters located outside the outermost of the two concentric tubes. Plasma electrodes are positioned about the reaction volume and between the two concentric tubes. The ambient between the two tubes is controlled to protect the electrodes from oxidation at the high temperatures to which they are exposed. An rf generator is coupled to the plasma electrodes and is controllable independently from the resistance heaters.

REFERENCES:
patent: 4115184 (1978-09-01), Poulsen
patent: 4253907 (1981-03-01), Parry et al.
patent: 4430547 (1984-02-01), Yoneda et al.
patent: 4547648 (1985-10-01), Longeway
patent: 4550239 (1985-10-01), Vehara et al.
IBM Technical Disclosure Bulletin, vol. 25, No. 10, 3-1983, by Stein.

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