Plasma-enhanced CVD of oxide superconducting films by utilizing

Superconductor technology: apparatus – material – process – High temperature – per se – Having tc greater than or equal to 150 k

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505727, 505734, 505737, 427 62, 427575, 427576, 427598, B05D 306, B05D 314, B05D 512

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active

052623963

ABSTRACT:
A method for forming a superconducting oxide material including introducing an oxygen or an oxidizing gas and a reactive gas or reactive solution or reactive minute particles into a plasma generating chamber; applying a magnetic field to the plasma generating chamber; supplying microwaves to the plasma generating chamber wherein the direction of the magnetic field and the propagation direction of the microwaves are parallel such that the oxygen or the oxidizing gas and the reactive gas or reactive solution or reactive minute particles are converting into the plasma; and forming the superconducting oxide material on a film forming surface positioned in the plasma generating chamber during the application of the magnetic field.

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Wall Street Journal, "Lab vs. Factory: Superconductors Pose Big Problems of Fabrication", Jul. 9, 1987.
Bonifield "Plasma Assisted Chemical Vapor Deposition" pp. 365-384 Deposition Technique for Films and Coatings Ed. by Bunshah et al. Chapt. 9. Noyes Publications 1982.
Bednorz et al. "Possible High Tc Superconductivity in the Ba-La-Cu-O System" Z. Phys. B-Condensed Matter 64 pp. 189-193 (1986).

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