Plasma enhanced CVD deposition of tungsten and tungsten compound

Details Plasma enhanced CVD deposition of tungsten and tungsten compound Plasma enhanced CVD deposition of tungsten and tungsten compound

1998-11-05

2000-03-14

Powell, William

Semiconductor device manufacturing: process

Chemical etching

Vapor phase etching

438694, 438720, 438721, 438742, 438692, H01L 2100

Patent

active

06037263&

ABSTRACT:
A method for plasma assisted CVD deposition of tungsten and of tungsten compounds is described wherein a plasma containing a high density of active hydrogen species is maintained to scavenge fluorine and fluoride species formed by the decomposition of the tungsten precursor WF.sub.6. The activated hydrogen species also assist in the breaking of W--F bonds, thereby facilitating the decompoition process and forming high density, high conductivity, fluoride free conductive films of tungsten and of tungsten compounds. The ability to form such fluoride free tungsten films with the assistance of activated hydrogen species, permits the deposition of tungsten directly onto gate oxides thereby enabling the formation of tungsten gate electrodes without underlying polysilicon. Low conductivity tungsten contacts including in-situ formed tungsten compound barrier layers may also be formed by this process.

REFERENCES:
patent: 4692343 (1987-09-01), Price et al.
patent: 4838990 (1989-06-01), Jucha et al.
patent: 4874723 (1989-10-01), Jucha et al.
patent: 5028565 (1991-07-01), Chang et al.
patent: 5164330 (1992-11-01), Davis et al.
patent: 5407698 (1995-04-01), Emesh
patent: 5591486 (1997-01-01), Okano et al.
patent: 5747383 (1998-05-01), Chen et al.
patent: 5753533 (1998-05-01), Saito
S. Wolf, "Silicon Processing for the VLSI Era" vol. 2, Lattice Press, Sunset Beach, CA, 1990, p247, 398.

Affiliated with

Also associated with

Rating

Plasma enhanced CVD deposition of tungsten and tungsten compound does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Plasma enhanced CVD deposition of tungsten and tungsten compound, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Plasma enhanced CVD deposition of tungsten and tungsten compound will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-168911