Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board
Patent
1990-10-05
1992-07-28
Beck, Shrive
Coating processes
Electrical product produced
Integrated circuit, printed circuit, or circuit board
118723, 118728, 118733, 156345, 156643, 20419232, 20429834, C23C 1650
Patent
active
051339862
ABSTRACT:
A high-efficiency, low-temperature, plasma-enhanced chemical vapor deposition (PECVD) system for growing or depositing various types of thin films on substrate surfaces, or etching such surfaces, using substrates of materials such as silicon, plastic, etc. The system uses a hollow-cathode-effect electron source with a surrounding confining electrode to create a plasma at the substrate surface to insure that the density of reactive species is both enhanced and localized at the substrate surface thus causing the rate of growth of the films, or the etch rate, to increase so that the process can take place at much lower temperatures and power levels. A particular embodiment involves the growing of hydrogenated amorphous silicon (a:Si:H), at room temperature, on silicon using a tubular reactor containing a cylindrical electrode lining the inside of the reactor walls acting as a counter electrode for an rf-powered, substrate-supporting electrode near the center of the reactor. A set of silicon wafers, on which the amorphous silicon is grown, is mounted on the latter electrode. The reaction gases (silane) flowing between the electrodes are decomposed in a plasma excited by an rf power source (13.56 MHz) connected to the substrate-supporting electrode. With the use of appropriate deposition parameters (silane flow rate, pressure, applied power and frequency, and substrate spacing) room temperature growth of a-Si:H is achieved at growth rates up to 15 .ANG./sec, while keeping a low hydrogen concentration (.about.10%) and the bonded hydrogen in the Si-H monohydride configuration.
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Blum Joseph M.
Bumble Bruce
Chan Kevin K.
Conde Joao R.
Cuomo Jerome J.
Beck Shrive
Dowd Thomas P.
International Business Machines - Corporation
Owens Terry J.
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