Plasma electroplating

Details Plasma electroplating Plasma electroplating

2007-01-23

2007-01-23

Mayekar, Kishor (Department: 1753)

Electrolysis: processes, compositions used therein, and methods

Electrolytic coating

Forming nonmetal coating

C205S322000, C205S323000, C205S333000, C427S569000, C427S570000

Reexamination Certificate

active

10130582

ABSTRACT:
A method for depositing a film of an advanced material on a surface of an article is disclosed. The method comprises placing the article within a bath having a pair of spaced electrodes one of which is formed by the article and an electrolyte containing a source of the material to be deposited. A stream of bubbles is generated within the electrolyte adjacent to the cathode. A potential difference is applied across the cathode and anode such that a plasma glow discharge is formed in the bubble region. The plasma of ionised gaseous molecules formed within the bubble region acts to deposit a film of material on the surface of the article. The method may be carried out at atmospheric pressure and does not require a vacuum apparatus. An apparatus for carrying out this method is also disclosed.

REFERENCES:
patent: 4447299 (1984-05-01), Kasaaian et al.
patent: 5700366 (1997-12-01), Steblianko et al.
patent: 5759243 (1998-06-01), Johnson et al.
patent: 6368467 (2002-04-01), Andrews et al.
T. Paulmier et al., “A New Thin Film Deposition Process By Cathodic Plasma Electrolysis”, The Australian Institute of Physics, 28th Annual Condensed Matter and Materials, Feb. 3-6, 2004, WP37.

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