Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Electron or ion source
Patent
1982-02-18
1984-07-03
LaRoche, Eugene R.
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Electron or ion source
31323141, 31511121, H01J 2904
Patent
active
044581807
ABSTRACT:
A plasma electron source has an apertured cathode, and a housing for defining a cavity behind the aperture. A trigger electrode, in communication with the cavity, is responsive to a short-duration trigger pulse for establishing plasma in the cavity. The plasma is sustained in the cavity subsequent to the termination of the trigger pulse by a bias circuit, which biases the cavity at a relatively low voltage with respect to the cathode for a period of time much longer than the duration of the trigger pulse.
REFERENCES:
patent: 3153175 (1964-10-01), Winzeler
patent: 3323002 (1967-05-01), Lafferty
patent: 3678334 (1972-07-01), Dugdale et al.
patent: 3702416 (1972-11-01), Bex et al.
Cooperstein Gerald
Fleischer David
Goldstein Shyke A.
Hearn David R.
Sohval A. Robert
Elscint Ltd.
LaRoche Eugene R.
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