Plasma doping processing device and method thereof

Details Plasma doping processing device and method thereof Plasma doping processing device and method thereof

2008-08-28

2010-10-26

Meeks, Timothy H (Department: 1715)

Coating processes

Measuring, testing, or indicating

C427S569000, C118S712000, C118S7230ER

Reexamination Certificate

active

07820230

ABSTRACT:
An amount of leakage of a substrate-cooling gas into a vacuum container is measured by using a flow-rate measuring device so that the flow rate of a diluting gas that is the same as the substrate-cooling gas is controlled by a control device or a plasma doping time is prolonged, in accordance with the amount of leakage.

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International Preliminary Report on Patentability and Written Opinion of the International Searching Authority, issued in corresponding International Patent Application No. PCT/JP2008/002341, dated on Mar. 18, 2010.

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