Etching a substrate: processes – Forming or treating optical article
Patent
1997-04-21
1999-07-20
Powell, William
Etching a substrate: processes
Forming or treating optical article
216 5, 216 39, 216 18, B44C 122
Patent
active
059252626
ABSTRACT:
A plasma display panel is disclosed including: a transparent insulating substrate; a plurality of transparent electrodes in a strip arrangement with each electrode having a groove that runs along the median of its surface and has a predetermined width and depth at its center, and side walls on both sides of the groove, the side walls serving as barrier ribs; a fluorescent layer formed in each groove; and a plurality of electrodes in strip arrangement having a predetermined distance between one another and perpendicular to the transparent electrodes, the electrodes being supported by supporting means formed on a predetermined portion of barrier rib located on the edge portion of the substrate.
REFERENCES:
patent: 5247227 (1993-09-01), Park
patent: 5340491 (1994-08-01), Enomoto et al.
Choi Nak-Heon
Kim Jin-man
Ok Do-Young
Pyun Deuk-Soo
Hyundai Electronics Industries Co,. Ltd.
Powell William
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