Plasma discharge ion source

Details Plasma discharge ion source Plasma discharge ion source

1977-08-08

1979-02-13

Dixon, Harold A.

Radiant energy

Ion generation

Field ionization type

250427, H01J 2700

Patent

active

041397720

ABSTRACT:
An ion source is described in which a compound of the material of a desired ion is dissociated in a plasma discharge process to provide a beam of charged particles including the desired ions. The proportion of the desired ion in the particle beam is selected by adjustment of the temperature of the plasma, and, for increasing the range of selection of obtainable proportions, various means are described for increasing the plasma temperature beyond that which was previously attainable in ion sources of this type.

REFERENCES:
patent: 2373151 (1945-04-01), Taylor
patent: 2427484 (1947-09-01), West
patent: 2826708 (1958-03-01), Foster
patent: 2829259 (1958-04-01), Foner et al.
patent: 2831996 (1958-04-01), Martina
patent: 3500077 (1970-03-01), Post
patent: 3900585 (1975-08-01), Matsubara
patent: 3999072 (1976-12-01), Takagi
"Physical Electronics" by Hemenway et al., pp. 215-219, published by John Wiley, 1967.

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