Plasma device with low thermal noise

Details Plasma device with low thermal noise Plasma device with low thermal noise

2008-11-27

2011-12-13

Choi, Jacob Y (Department: 2821)

Communications: radio wave antennas

Antennas

Having electric space discharge device

C343S785000, C118S7230AN, C315S111210

Reexamination Certificate

active

08077094

ABSTRACT:
A plasma device having low thermal noise, which results in a high signal-to-noise ratio (SNR) of the plasma device. The plasma device includes devices with a plasma that is responsive to electromagnetic radiation and/or electrical signals. In various configurations, the plasma device has a plasma in which the temperature, resistance, pressure, and/or collision frequency are at a level sufficiently low to produce an acceptable level of noise. In another configuration, the operating frequency of the plasma device is at a level sufficiently high to produce an acceptable level of noise. Decreasing the noise level results in increasing the signal-to-noise ratio and increasing the data rate. The plasma temperature is reduced by operating the plasma device in the afterglow state. The plasma electron temperature is reduced by confining high energy electrons in a potential well and by using an electron emitting filament.

REFERENCES:
patent: 5304279 (1994-04-01), Coultas et al.
patent: 5558718 (1996-09-01), Leung
patent: 5594456 (1997-01-01), Norris et al.
patent: 6369763 (2002-04-01), Norris et al.
patent: 6870517 (2005-03-01), Anderson
patent: 6922173 (2005-07-01), Anderson
patent: 7145512 (2006-12-01), Metz
patent: 7274333 (2007-09-01), Alexeff
patent: 7292191 (2007-11-01), Anderson
patent: 7342549 (2008-03-01), Anderson
patent: 7453403 (2008-11-01), Anderson
D.C. Jenn, “Plasma Antennas: Survey of Techniques and Current State of the Art,” Naval Postgraduate School, Monterey, CA, Rep. NPS-CRC-03-001, Sep. 2003.

Affiliated with

Also associated with

Rating

Plasma device with low thermal noise does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Plasma device with low thermal noise, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Plasma device with low thermal noise will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4312954