Chemistry: electrical and wave energy – Processes and products – Vacuum arc discharge coating
Patent
1982-03-11
1983-08-16
Demers, Arthur P.
Chemistry: electrical and wave energy
Processes and products
Vacuum arc discharge coating
118723, 156345, 156643, 204164, 204298, C23C 1500
Patent
active
043990169
ABSTRACT:
In a support member for supporting a sample processed in a hollow space between first and second electrodes between which a high frequency a.c. voltage is supplied to produce plasma in the hollow space, a conductor is laid on the first electrode with a first dielectric layer interposed therebetween and is covered with a second dielectric layer to be attached to the sample. A d.c. voltage source is connected through the first dielectric layer out of contact with the first electrode to induce electrostatic attraction during production of the plasma and, thereby, to fixedly attach the sample to the second dielectric layer. A temperature control member is embedded in the first electrode to control a temperature of the sample. The control member may be a cooling member or a heater. A plurality of the support members may be located on the first electrode. Preferably, the first and the second dielectric layers are of epoxy resin and polyimide resin, respectively.
REFERENCES:
patent: 4252626 (1981-02-01), Wright et al.
patent: 4279216 (1981-07-01), Buhl et al.
Takei Hideo
Tsukada Tsutomu
Anelva Corporation
Demers Arthur P.
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