Plasma development process controller

Details Plasma development process controller Plasma development process controller

1979-01-02

1981-01-20

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

156627, 156643, 156646, 204192E, 356341, G01N 2100, B44C 122, C03C 1500, C03C 2506

Patent

active

042460603

ABSTRACT:
End point detection in developing photoresist is accomplished by monitoring the output of a photodetector and sensing a plateau in the output.

REFERENCES:
Kodak Microelectronics Seminar, 1976, A Study of the Optical Emission From A RF Plasma During Semiconductor Etching, by Harshbarger et al., pp. 1-24.

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