Plasma developable photoresist compositions containing perylene

Details Plasma developable photoresist compositions containing perylene Plasma developable photoresist compositions containing perylene

1985-06-03

1987-10-06

Schilling, Richard L.

Radiation imagery chemistry: process, composition, or product th

Imaged product

Nonsilver image

430271, 430272, 430275, 430281, 430325, 430919, 430924, 430925, 430926, 430920, 522 26, 522 30, 522 63, G03C 170

Patent

active

046982868

ABSTRACT:
Disclosed are plasma developable photoresist compositions that possess photosensitivity to 436 n.m. light and maintain this photosensitivity for suitable periods of time after coating are obtainable. These compositions comprise perylene, certain perylene derivatives, or certain coumarin derivatives as photosensitizers in combination with N-vinyl monomers, haloalkene photoinitiators, and suitable polymeric binders in a suitable solvent.

REFERENCES:
patent: 3533797 (1970-10-01), James et al.
patent: 3640718 (1972-02-01), Smith
patent: 3899338 (1975-08-01), Lewis
patent: 3925077 (1975-12-01), Lewis et al.
patent: 4147552 (1979-04-01), Specht et al.
patent: 4278753 (1981-07-01), Lewis et al.
patent: 4289844 (1981-09-01), Specht et al.

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