Plasma deposition of spin chucks to reduce contamination of...

Details Plasma deposition of spin chucks to reduce contamination of... Plasma deposition of spin chucks to reduce contamination of...

2005-10-18

2005-10-18

Hassanzadel, P. (Department: 1763)

Coating apparatus

With means to centrifuge work

C118S724000, C118S725000, C118S728000, C118S500000, C156S345510, C156S345530, C156S915000, C279S003000

Reexamination Certificate

active

06955720

ABSTRACT:
An apparatus for delivering a fluidic media to a wafer includes a housing defining a process chamber. A fluidic media delivery member is coupled to the process chamber. A rotatable chuck is positioned in the process chamber. The rotatable chuck has a wafer support surface coated with a coating material. A vacuum supply line is coupled to the rotatable chuck.

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