Plasma deposited substrate structure

Stock material or miscellaneous articles – Composite

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

428407, 4284235, 4284744, 204165, 427488, C08F 246, C08J 718

Patent

active

059621389

ABSTRACT:
A substrate structure having three-dimensional functional film network comprising a plurality of radio frequency discharge plasma film layers. The plasma film layers include a first layer, comprising a plurality of a first functional group, and a second layer, comprising a plurality of a second functional group. The employment of three-imensional film networks with desired functional groups located either on the periphery or both the periphery and interstitial spaces of the networks provides means for significantly increasing the surface functional density.

REFERENCES:
patent: 4587329 (1986-05-01), Tomalia et al.
patent: 4693799 (1987-09-01), Yanagihara et al.
patent: 5342693 (1994-08-01), Winters et al.
patent: 5393795 (1995-02-01), Hedstrand et al.
patent: 5444811 (1995-08-01), Yoshimura et al.
patent: 5449383 (1995-09-01), Chatelier et al.
patent: 5723219 (1998-03-01), Holluri et al.
Gombotz et al; "Functionalization of Polymeric Films by Plasma Polymerization of Allyl Alcohol and Allylamine"; Pol.Mat.Sci & Eng (1990).
Greisser et al; "Characterization of Plasma Polymer Films from Amines and other Polar Monomers"; Polymeric Materials Sci & Eng, vol. 56, pp. 720-725 (1987).
Sanchez et al; "Plasma Deposition of Copolymers and Their Permeation Characteristics", Polymeric Materials Science & Eng. vol. 56, pp. 792-796 (1987).
Ward; Surface Modification Prior to Surface Formation: Control of Polymer Surface Properties via Bulk Composition; Medical Plastics & Biomaterials, pp. 34-41 (Spring 1995).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Plasma deposited substrate structure does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Plasma deposited substrate structure, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Plasma deposited substrate structure will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1169411

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.