Plasma CVD process for coating a dome-shaped substrate

Details Plasma CVD process for coating a dome-shaped substrate Plasma CVD process for coating a dome-shaped substrate

1991-10-29

1993-08-17

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

118715, C23C 1650

Patent

active

052365115

ABSTRACT:
A plasma-CVD process and apparatus for coating strongly arched, dome-like substrates with a dielectric and/or metallic coating system on the inside and/or outside face. The thickness of the gas layer to be reacted above the face to be coated is adjusted such as with the aid of the displacement body, so that the extent of the homogeneous reaction or formation occurring in the gas layer during a plasma phase is harmless for the desired coating quality. Strongly arched substrates coated with a uniform coating of highest optical quality and also mechanical, thermal and chemical stability without complicated substrate movement. Specified axial and azimuthal coating thickness profiles can also be superimposed by suitably shaping the displacement body.

REFERENCES:
patent: 3731650 (1973-05-01), Schweikert et al.
patent: 3926508 (1975-12-01), Harmsen et al.
patent: 4719873 (1988-01-01), Fujiyama
patent: 4729341 (1988-03-01), Fournier
patent: 4979467 (1990-12-01), Kamaji
patent: 4995341 (1991-02-01), Matsuyama
patent: 5000113 (1991-03-01), Wang
Patent Abstracts of Japan, vol. 13, No. 145, Apr. 10, 1989.

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