Coating processes – Direct application of electrical – magnetic – wave – or... – Pretreatment of substrate or post-treatment of coated substrate
Patent
1995-04-04
1996-10-08
Pianalto, Bernard
Coating processes
Direct application of electrical, magnetic, wave, or...
Pretreatment of substrate or post-treatment of coated substrate
118 50, 118600, 118715, 4271263, 4271264, 427249, 427255, 4272553, 427294, 427296, 427307, 427309, 427322, 427535, 427536, 427537, 427539, 427553, 427561, 427568, 427576, 427577, 427579, 427595, C23C 1402
Patent
active
055629520
ABSTRACT:
In a plasma-CVD method and apparatus, plasma is formed from a film material gas in a process chamber and, in the plasma, a film is deposited on a substrate disposed in the process chamber. Formation of the plasma from the material gas is performed by application of an rf-power prepared by effecting an amplitude modulation on a basic rf-power having a frequency in a range from 10 MHz to 200 MHz. A modulation frequency of the amplitude modulation is in a range from 1/1000 to 1/10 of the frequency of the basic rf-power. Alternatively, the rf-power is prepared by effecting on the basic rf-power a first amplitude modulation at a frequency in a range from 1/1000 to 1/10 of the frequency of the basic rf-power, and additionally effecting a second amplitude modulation on the modulated rf-power. A modulation frequency of the second amplitude modulation is in a range from 1/100 to 100 times the modulation frequency of the first amplitude modulation.
REFERENCES:
Patent Abstracts Of Japan, vol. 017, No. 554 (C-118) 6 Oct. 1993 & JP-A-05 156 451 (Nissin Electric Co Ltd) 22 Jun. 1993 (Abstract).
Patent Abstracts Of japan, vol. 017, No. 361 (C-1080) 8 Jul. 1993 & JP-A-05 051 753 (Nissin Electric Co Ltd) 2 Mar. 1993 (Abstract).
36th National Symposium Of The American Vacuum Society, Boston, MA, USA, 23-27 Oct. 1989, ISSN 0734-2101, Journal Of Vacuum Science & Technology A A (Vacuum, Surfaces, And Films), May-Jun. 1990, USA pp. 1851-1856 Verdeyen J. T. et al "Modulated Discharges: Effect on Plasma Parameters and deposition".
"Application of Modulated RF Discharge to a-Si:H Deposition," Proceedings of Japanese Symposium on Plasma Chemistry, vol. 1, 1988, M. Shiratani et al. (No month available).
"Effects of Low-frequency Modulation on RF Discharge Chemical Vapor Deposition," Appl. Phys. Lett. 53 (14), Oct. 3, 1988, Y. Watanabe et al.
"Reaction Control in Processing Plasmas by Square-Wave-Amplitude-Modulating RF Voltage," Technology Reports of Kyushu University, vol. 62, No. 6, Dec. 1989, Masaharu Shiratani et al.
Kirimura Hiroya
Kuwahara Hajime
Maeda Hiroshi
Murakami Hiroshi
Nakahigashi Takahiro
Nissin Electric Co. Ltd.
Pianalto Bernard
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