Coating apparatus – Gas or vapor deposition – Work support
Reexamination Certificate
2007-03-27
2007-03-27
Hassanzadeh, Parviz (Department: 1763)
Coating apparatus
Gas or vapor deposition
Work support
C118S7230ER
Reexamination Certificate
active
10735621
ABSTRACT:
A plasma CVD apparatus comprises an anode electrode and a cathode electrode, and is for forming a thin film on a substrate by performing plasma discharge between the anode electrode and the cathode electrode, comprising: a substrate holder disposed between the anode electrode and the cathode electrode; and one conductive member disposed between the substrate holder and one electrode of either the anode electrode or the cathode electrode, wherein the substrate holder supports the substrate, the one conductive member is provided between the one electrode and the substrate holder so as to substantially cover an entire space between the one electrode and the substrate holder, and the one conductive member is electrically connected to the one electrode and the substrate holder.
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Fujioka Yasushi
Fukuoka Yuhsuke
Kishimoto Katsushi
Nomoto Katsuhiko
Shimizu Akira
Arancibia Maureen G.
Hassanzadeh Parviz
Nixon & Vanderhye P.C.
Sharp Kabushiki Kaisha
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