Plasma CVD apparatus

Details Plasma CVD apparatus Plasma CVD apparatus

1986-04-28

1987-11-17

Miles, Tim

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

118730, 118725, C23C 232

Patent

active

047072105

ABSTRACT:
A plasma chemical vapor deposition apparatus comprises internal construction members comprising aluminum having surfaces exposed to a plasma atmosphere.

REFERENCES:
patent: 4149923 (1979-04-01), Uehara et al.
patent: 4226208 (1980-10-01), Nishida et al.
patent: 4230515 (1980-10-01), Zajac
patent: 4380489 (1983-04-01), Beinvogl et al.
patent: 4392452 (1983-07-01), Taketoshi et al.
patent: 4466380 (1984-08-01), Jansen et al.
patent: 4483737 (1984-11-01), Mantei
patent: 4526644 (1985-07-01), Fujiyama et al.

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