Plasma confining apparatus

Details Plasma confining apparatus Plasma confining apparatus

1985-03-18

1986-12-02

Bueker, Richard

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

118718, 118720, 118723, 118 501, C23C 1308

Patent

active

046264477

ABSTRACT:
Apparatus for and a method of confining the ionized plasma developed during the glow discharge deposition of thin film semiconductor alloy material to preselected portions of the plasma region so as to prevent etching and deposit only uniform, nonhomogeneous semiconductor alloy material.

REFERENCES:
patent: 4479455 (1984-10-01), Doehler et al.
patent: 4511593 (1985-04-01), Brandolf
patent: 4512283 (1985-04-01), Bonifield et al.

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