Chemistry: physical processes – Physical processes – Crystallization
Patent
1974-06-07
1977-03-22
Scovronek, Joseph
Chemistry: physical processes
Physical processes
Crystallization
219121P, B01J 100
Patent
active
040134156
ABSTRACT:
A plasma-chemical reactor for treatment of disperse materials comprises a vertical working chamber. The top portion of the working chamber includes means to feed the disperse material into the reactor. The working chamber is provided with means for feeding and plasma-heating process gas, said means being a number of plasmatrons the nozzles of which are arranged along the periphery of the working chamber bottom portion and directed essentially at a right angle to the working chamber vertical axis. The reactor also includes means for evacuating gaseous products from the working chamber and a bin located under the working chamber and communicating with the bottom portion thereof.
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patent: 3541297 (1970-11-01), Sunnen et al.
patent: 3764272 (1973-10-01), Sterling
patent: 3830997 (1974-08-01), Essers et al.
patent: 3923467 (1975-12-01), Bonet et al.
TAFA Chemical Bulletin, 54-A5, TAFA Division, Humphreys Corp. 180 N. Main Street, Concord, New Hampshire 03301.
TAFA Bulletin P64/68, TAFA Division, Humphreys Corp. 180 N. Main Street, Concord, New Hampshire 03301.
Burov Igor Sergeevich
Bysjuk Vladimir Vladimirovich
Mosse Alfred Lvovich
Shkurko Leonid Stepanovich
Vashkevich Vyacheslav Andreevich
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