Plasma-based gas treatment system integrated in a vacuum pump

Details Plasma-based gas treatment system integrated in a vacuum pump Plasma-based gas treatment system integrated in a vacuum pump

2011-08-16

2011-08-16

Griffin, Walter D (Department: 1774)

Chemical apparatus and process disinfecting, deodorizing, preser

Chemical reactor

With means applying electromagnetic wave energy or...

C422S186030, C422S186040, C422S900000, C422S906000, C417S244000

Reexamination Certificate

active

07998426

ABSTRACT:
A pumping system comprising at least one pump unit (2) with a vacuum pump casing in which there are multiple pumping stages that includes at least one pumped gas treatment system is provided. The pumped gas treatment system compromises at least one plasma source located inside the vacuum pump casing of the pump unit, to generate a plasma that at least partially decomposes certain gases passing through the pump unit. This reduces the size of the pumped gas treatment system and improves its efficiency so that a gas pumping and treatment system can be created that is sufficiently small as to allow it to be placed in close proximity to the process chambers.

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Patent Abstracts of Japan, vol. 2002, No. 03, Apr. 3, 2002 corresponding to JP 2001 314752 A (Hokushin Ind, Inc.—Honda Motor Co. Ltd).

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